Active wafer probe

ABSTRACT

A probe suitable for probing a semiconductor wafer that includes an active circuit. The probe may include a flexible interconnection between the active circuit and a support structure. The probe may impose a relatively low capacitance on the device under test.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of U.S. Patent Application Ser. No.60/532,756, filed Dec. 24, 2003, and U.S. Patent Application Ser. No.60/589,346, filed Jul. 20, 2004.

BACKGROUND OF THE INVENTION

A probe suitable for probing a semiconductor wafer that includes anactive circuit.

BRIEF SUMMARY OF THE INVENTION

There are many types of probing assemblies that have been developed forthe measurement of integrated circuits and other forms ofmicroelectronic devices. One representative type of assembly uses acircuit card on which the upper side is formed of elongate conductivetraces that serve as signal and ground lines. A central opening isformed in the card, and a needle-like probe tip is attached to the endof each signal trace adjacent the opening so that a radially extendingarray of downwardly converging needle-like tips is presented by theassembly for selective connection with the closely spaced pads of themicroelectronic device being tested. A probe assembly of this type isshown, for example, in Harmon U.S. Pat. No. 3,445,770. This type ofprobing assembly, however, is unsuitable for use at higher frequencies,including microwave frequencies in the gigahertz range, because at suchfrequencies the needle-like tips act as inductive elements and becausethere are no adjoining elements present to suitably counteract thisinductance with a capacitive effect in a manner that would create abroadband characteristic of more or less resistive effect. Accordingly,a probing assembly of the type just described is unsuitable for use atmicrowave frequencies due to the high levels of signal reflection andsubstantial inductive losses that occur at the needle-like probe tips.

In order to obtain device measurements at somewhat higher frequenciesthan are possible with the basic probe card system described above,various related probing systems have been developed. Such probingsystems are designed to present a typical transmission line impedance,such as 50 ohms, to the device under test. Such systems are shown, forexample, in Evans U.S. Pat. No. 3,849,728; Kikuchi Japanese PublicationNo. 1-209,380; Sang et al. U.S. Pat. No. 4,749,942; Lao et al. U.S. Pat.No. 4,593,243; and Shahriary U.S. Pat. No. 4,727,319. Yet anotherrelated system is shown in Kawanabe Japanese Publication No. 60-223,138which describes a probe assembly having needle-like tips where the tipsextend from a coaxial cable-like structure instead of a probe card. Acommon feature of each of these systems is that the length of theisolated portion of each needle-like probe tip is limited to the regionimmediately surrounding the device-under-test in order to minimize theregion of discontinuity and the amount of inductive loss. However, thisapproach has resulted in only limited improvement in higher frequencyperformance due to various practical limitations in the construction ofthese types of probes. In Lao et al., for example, the length of eachneedle-like tip is minimized by using a wide conductive blade to spanthe distance between each tip and the supporting probe card, and theseblades, in turn, are designed to be arranged relative to each other soas to form transmission line structures of stripline type. As apractical matter, however, it is difficult to join the thin verticaledge of each blade to the corresponding trace on the card whilemaintaining precisely the appropriate amount of face-to-face spacingbetween the blades and precisely the correct pitch between the ends ofthe needle-like probe tips.

One type of probing assembly that is capable of providing acontrolled-impedance low-loss path between its input terminal and theprobe tips, such as a typical transmission line impedance, is shown inLockwood et al. U.S. Pat. No. 4,697,143. In Lockwood et al., aground-signal-ground arrangement of strip-like conductive traces isformed on the underside of an alumina substrate so as to form a coplanartransmission line on the substrate. At one end, each associated pair ofground traces and the corresponding interposed signal trace areconnected to the outer conductor and the center conductor, respectively,of a coaxial cable connector. At the other end of these traces, areas ofwear-resistant conductive material are provided in order to reliablyestablish electrical connection with the respective pads of the deviceto be tested. Layers of ferrite-containing microwave absorbing materialare mounted about the substrate to absorb spurious microwave energy overa major portion of the length of each ground-signal-ground tracepattern. In accordance with this type of construction, a controlledhigh-frequency impedance (e.g., 50 ohms) can be presented at the probetips to the device under test.

To achieve improved spatial conformance between the tip conductors of aprobe and an array of non-planar device pads or surfaces, severalhigh-frequency probing assemblies have been developed. Such assembliesare described, for example, in Drake et al. U.S. Pat. No. 4,894,612;Coberly et al. U.S. Pat. No. 4,116,523; and Boll et al. U.S. Pat. No.4,871,964. Similarly, such probing assembly is designed to present atypical transmission line impedance, such as 50 ohms, to the deviceunder test. The Drake et al. probing assembly includes a substrate onthe underside of which are formed a plurality of conductive traces whichcollectively form a coplanar transmission line. However, in oneembodiment shown in Drake et al., the tip end of the substrate isnotched so that each trace extends to the end of a separate tooth andthe substrate is made of moderately flexible nonceramic material. Themoderately flexible substrate permits, at least to a limited extent,independent flexure of each tooth relative to the other teeth so as toenable spatial conformance of the trace ends to slightly non-planarcontact surfaces on a device-under-test.

With respect to the probing assembly shown in Boll et al., as citedabove, the ground conductors comprise a pair of leaf-spring members therear portions of which are received into diametrically opposite slotsformed on the end of a miniature coaxial cable for electrical connectionwith the cylindrical outer conductor of that cable. The center conductorof the cable is extended beyond the end of the cable (i.e., as definedby the ends of the outer conductor and the inner dielectric) and isgradually tapered to form a pin-like member having a rounded point. Inaccordance with this construction, the pin-like extension of the centerconductor is disposed in spaced apart generally centered positionbetween the respective forward portions of the leaf-spring members andthereby forms, in combination with these leaf-spring members, a roughapproximation to a ground-signal-ground coplanar transmission linestructure.

A disadvantage of the probes described above is that the relatively lowinput impedance of the transmission lines (e.g., 50 ohms) results in thepossibility that the testing operation might significantly disturb thesignal at the probed pads. Further, the probes impose a relativelysignificant capacitance to the probed pads which tends to likewise alterthe signal at the probed pads. Hence, traditional low impedance probesmay have adequate electrical transmission characteristics at highfrequencies but are unsuitable for many applications because of theloading as a result of the probe on the circuit to be probed.

Gleason et al., U.S. Pat. No. 4,853,627, disclose a wafer probe with ahigh input impedance that includes a support member having an end regionwhich is shaped to permit the end region to be brought into closeproximity with a component under test. An amplifier with a relativelyhigh input impedance is rigidly mounted on the support member at its endregion. An elongate “wire-like” conductive probe element is rigidlyattached to the amplifier and is electrically connected to theamplifier's input terminal. A transmission line is connected to theamplifier's output terminal, which normally has a typical transmissionline impedance such as 50 ohms, for transmitting signals from theamplifier to a measurement instrument.

While the wafer probe of Gleason et al. provides a relatively high inputimpedance to the device under test, it imposes significant capacitanceto the device under test. In many cases the probe element used forprobing has approximately 1 fF per 1,000^(th) of an inch (25.4 micronsper 1,000^(th) of an inch). The elongate “wire-like” conductive probeelement of Gleason et al. is approximately 250 microns in length andaccordingly has approximately 10 fF of capacitance. The amplifier hasapproximately another 10 fF thereby presenting approximately 20 fF tothe device under test.

A probe that includes an amplifier implemented in silicon is provided byG. G. B. Industries of Gillette, N.J. as Model 34A. The probe includesan elongate “wire-like” conductive probe element that is approximately3,000 microns in length, thus imposing at least approximately 120 fF incapacitance at 3 GHZ. The amplifier has approximately 10 fF, therebyimposing approximately 130 fF to the device under test. The probeincludes a pair of adjacent lines extending partially along the probeelement having a “guard potential”. However, the capacitance of the 34Aprobe by G. G. B. Industries tends to significantly increase incapacitance as the frequency increases above 3 GHZ because the phase ofthe guard conductors becomes out of phase with the signal conductor(probe element).

The foregoing and other objectives, features, and advantages of theinvention will be more readily understood upon consideration of thefollowing detailed description of the invention, taken in conjunctionwith the accompanying drawings.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

FIG. 1 illustrates a probe, an active circuit, a flexible interconnect,and a supporting structure.

FIG. 2 illustrates a probe in contact with a device under test.

FIG. 3 illustrates a bent-tip probe in contact with a device under test.

FIG. 4 illustrates a probing element.

FIG. 5 illustrates a sacrificial substrate with a depression therein.

FIG. 6 illustrates another probe, an active circuit, a flexibleinterconnect, and a supporting structure.

FIG. 7 illustrates yet another probe, an active circuit, a flexibleinterconnect, and a supporting structure.

FIG. 8 illustrates yet another probe, an active circuit, a flexibleinterconnect with a bend therein, and a supporting structure.

FIG. 9 illustrates a frequency response.

FIG. 10 illustrates a schematic and signal path on a probe for a passivetype probe.

FIG. 11 illustrates a probe a structural element.

FIG. 12 illustrates a probe with a flexible element.

FIG. 13 illustrates a probe with a strain gage.

FIG. 14 illustrates a probe with a vibration sensor.

FIG. 15 illustrates a probe with a reflective element.

FIG. 16 illustrates a differential probe.

FIG. 17 illustrates another differential probe.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENT

Active element based probes, such as those which include a high inputresistance and/or low input capacitance amplifier circuit, tend to besuitable for probing circuitry where the addition of a capacitance onthe order of approximately 100 fF for devices that are exceptionallysmall does not present a significant load to the circuitry. Mostamplifier circuits include external power using a bias circuit, whilepassive circuitry may potentially be used. However, in somecircumstances the loading of a circuit with 100 fF is simplyunacceptable for effective measurements. For example, in some cases anopening is machined on the back side of a wafer that includes circuitrythereon to permit access to a conductive trace interconnecting a pair oftransistor elements together, such as a pair of gates. With thecontinual shrinking of the size of the gate of transistors, togetherwith the decrease in the amount of current used for switching thetransistors, the loading of the circuit with a probe having on the orderof approximately 100 fF presents an unacceptably large load to thecircuit. The capacitive load on the circuit is sufficient that the edgetransitions of signals are slowed down significantly, even to the pointthat the measurements obtained are nearly meaningless since the desiredswitching time is significantly faster than the loaded circuit canaccommodate.

One technique to decrease the capacitance presented to the device undertest is to significantly reduce the length of the elongate probingelement. For example, the elongate probing element may be reduced fromapproximately 250 microns (Gleason et al.) or 3000 microns (G.B.B.device 34A), depending on the probe design, to under 150 microns or 2000in length. This reduces the capacitance loading on the device under testa corresponding amount. Unfortunately, merely reducing the length of theelongate probing element results in a significantly stiffer probingelement. The stiffer probing element has both a greater tendency tobreak the probe if pressed too hard against the device under test and agreater tendency to damage the device under test if pressed too hardbecause of its inability to bend. Accordingly, merely shortening theprobing element is a somewhat ineffective solution because the resultingdevice has minimal compliance.

Referring to FIG. 1, in order to permit more effective probing ofdevices under test with relatively short elongate probing elements thepresent inventors came to the realization that the compliance foreffective probing may be, at least partially, provided by a flexibleinterconnection between the active element and the supporting structure.The structure may be any suitable support, such as for example, asubstrate or shelf of a coaxial cable. In this manner, the length of theelongate probing element may be reduced, such as to 2000 microns, suchas to 1000 microns, such as to 500 microns, such as to 200 microns, suchas to 150 microns, such as to 100 microns, such as to 75 microns, ormore preferably such as to 40 microns or less which reduces thecapacitance of the elongate probing element while simultaneouslyproviding additional compliance with the device under test as a resultof the flexible interconnection. The flexible material is preferablypolyimide, although any suitable material may be used. Depending on thelength of the probing element, the resulting capacitance of the probe,as viewed by the device under test, is preferably 18 fF (including 10 fFactive element) or less, is thus more preferably 16 fF (including 10 fFactive element) or less, is thus more preferably 14 fF (including 10 fFactive element) or less, and is thus more preferably 12 fF (including 10fF active element) or less. The capacitance of the active element may bepotentially reduced depending upon the particular amplifier design used.Accordingly, the input capacitance imposed on the device under test ispreferably less than 20 fF (including 10 fF active element). Theamplifier may be characterized as having an input capacitance of lessthan 1000 fF, or less than 500 fF, or less than 250 fF, or less than 50fF, of less than 25 fF and more preferably less than 10 fF. Theamplifier circuit preferably has in input impedance substantiallygreater than 50 ohms, preferably more than 1,000 ohms, preferably morethan 100 K ohms, more preferably more than 250 K ohms, more preferablymore than 500 K ohms, more preferably an input impedance of more than 1M ohms, and an output impedance on the order of 50 ohms, preferably lessthan 1,000 ohms. In many cases, the input impedance is preferablygreater than the output impedance, and more preferably the inputimpedance is 100 times greater than the output impedance, and morepreferably the input impedance is 1,000 times greater than the outputimpedance, and more preferably the input impedance is 10,000 timesgreater than the output impedance. The output of the amplifier circuitmay include a current driver to the transmission line, which may have ahigh resistance and a low capacitance.

The flexible material preferably supports traces thereon, either on theupper surface or the lower surface, from the supporting structure to theactive element. The traces may likewise be encapsulated within theflexible material. Typically the supporting structure provides a type oftransmission structure, such as for example, a coplanar waveguide or astrip line configuration. In order to maintain the signal integrity tothe active element, the flexible material may include a transmissionstructure, such as for example, a coplanar waveguide or a strip lineconfiguration. Preferably, the type of transmission structure providedby the flexible material is of the same general class as that providedby the supporting structure.

As illustrated in FIG. 2, the elongate probing element is typicallyoriented at an acute angle with respect to the device under test so thatthe probing element has at least some limited compliance (i.e., bending)when probing the device under test. In addition, the probing element isalso typically brought into contact with the device under test in apartially horizontal motion so that the end of the probing elementscrubs the surface of the wafer and then impacting the side of the pador otherwise scrubbing across a portion of the pad. In this manner, itis easier to make contact between a small probe tip and a small contactportion under conditions that include some vibrations. Unfortunately, along elongate “needle-like” probing element tends to bend after repeatedcontacts resulting in a “curled” end portion, as illustrated in FIG. 3.After the end portion becomes sufficiently curled, the probe does noteffectively stop when impacting the side of the pad, but rather tends toskate up onto the pad, slide across the pad, and off the pad. Theinability to effectively stop when impacting the side of the pad makesprobing difficult.

The present inventors considered the existing probes that included anamplifier circuit interconnected to an elongate conductive probingelement and determined that to impose a small capacitance, thetraditional use of an elongate substantially cylindrical wire may bereplaced by a more structurally suitable probe element having adifferent geometry. Referring to FIG. 4, the probe structure preferablyhas a generally tapering tip portion over at least 25% or more, 35% ormore, 50% or more, 75% or more, and preferably 100% of the length of theprobe element. The tapering preferably continually decreases incross-sectional area along a majority, more preferably at least 75%, andmore preferably at least 100% of the respective tapered portion.

The probe element may be constructed using any suitable fabricationand/or machining process. However, to create a probe element that hasuniform structure shape in a repeatable manner a sacrificial substrateis preferably used, as shown in FIG. 5. The sacrificial substrate ispreferably copper or aluminum, although any suitable material may beused. A depression with a desirable shape may be created in thesubstrate using a dimpling tool (preferably made of material harder thanthe sacrificial substrate) or otherwise a mask together with a chemicaletch. In some cases, the chemical etch will create a depression in thesacrificial substrate along the grain boundaries. After creating asuitable depression, a conductive material is formed in the depression,such as nickel, aluminum, rhodium, or other conductive material(s). Ifdesired, a layer of rhodium may be deposited within the depressionfollowed by other conductive material to fill the depression. It wouldbe noted that rhodium has the characteristic that it does not tend tostick to material being probed and materials tend to slide on it ratherthan gall. The top of the sacrificial substrate is lapped to removeexcessive conductive material and form a flat planar surface. Atemporary material may be deposited or otherwise provided over theconductive material, if desired. The sacrificial substrate is thenremoved from the conductive material and temporary material (ifincluded) using a chemical or other technique. The probing elementsformed in this manner may be produced in an efficient manner using aplurality of depressions in the same sacrificial substrate. In addition,a variety of different shapes of depressions maybe included on a singlesacrificial substrate to create different probe elements, each of whichmay have different electrical characteristics. Also, the probe elementsformed in this manner tend to be substantially uniform.

After repeated use, the tip of the probe elements illustrated in FIG. 4do not tend to bend with such associated limitations previouslydescribed, but rather the tip of the probe elements tends to break orotherwise fracture. After the tip portion of the probe element breaks,the resulting probe element is slightly shorter. However, a probeelement with a portion broken away still tends to maintain a relativelysharp probing tip, and therefore maintains suitable structure forprobing the device under test. It is also noted that the probe elementdoes not bend, or incur any substantial flexing, under normal probingconditions unlike the substantial flexing that “needle-like” probesincur. Normal probing conditions may be defined as 10 grams of pressureor less, 5 grams of pressure or less, 2 grams of pressure or less, 0.5grams of pressure or less, or otherwise, as desired.

A couple techniques to interconnect an active circuit with a flexiblematerial to a substrate are illustrated, although other techniques maylikewise be used, as desired. The wafer probe shown in FIG. 6 comprisesa substrate support 10 of ceramic material. The substrate is generallytriangular when viewed from above, and is attached at its base to amounting block 12. At its apex, the substrate 10 carries a flexiblematerial 14, and a monolithic integrated circuit amplifier 16. Theamplifier may be a three stage source follower circuit implemented ingallium arsenide having an input impedance of about 100 megohms inparallel with about 10 fF. The amplifier has power supply terminals 18that are connected through microstrip conductors 20 and 50 ohm resistors22 to the terminals 24 of a D. C. voltage supply 26. The substrate 10carries at its underside a continuous layer 28 of conductive materialwhich is grounded by way of the block 12. The microstrip conductors 20and the layer 28 constitute two power-supply transmission lines eachhaving a characteristic impedance of 50 ohms. The transmission lines areterminated in their characteristic impedance by the resistors 22.By-pass capacitors 30 are connected between the terminals 24 and themounting block 12. Therefore, perturbations in the power supply voltagesare not transmitted to the amplifier.

A third microstrip conductor 40 is connected to the output terminal ofthe amplifier 16 by a wire 42 and extends between the amplifier 16 andthe central conductor of a coaxial connector 44. The conductor 40 andthe layer 28 together constitute a third transmission line. The coaxialconnector is used for connecting the third transmission line to ameasurement and display instrument, such as a sampling oscilloscope ornetwork analyzer. The amplifier also has an input terminal 46, which isconnected to a conductive probe element 50. The probe element 50 maycomprise, for example, a wire or non-wire element that is attached tothe input terminal of the amplifier 16.

In use, the illustrated probe is mounted by way of the mounting block ina probe station, and the probe is positioned so that the probe element50 contacts a node of interest in a circuit under test. A groundconnection and other power supply voltages are connected to the circuitunder test by way of other probes of conventional design. Signalsdeveloped at the node of interest are applied to the input terminal ofthe amplifier 16 by way of the probe element 50 and are transmitted byway of the output terminal, the wire 42, traces on the flexiblematerial, the transmission line 40 and the connector 44 to themeasurement and display instrument (not shown). Through use of theamplifier 16, a high input impedance is presented to the node ofinterest, and accordingly the operation of the circuit under test is notperturbed significantly by the testing operation. The amplifier 16preferably has a relatively low output impedance and accordingly is wellmatched to the transmission line 40.

As noted previously, the input impedance of the amplifier 16 is veryhigh. This stems from the fact that the value of G_(m)*Z_(g) for a fieldeffect transistor implemented in gallium arsenide (where G_(m) is thetransconductance of the transistor and Z_(g) is its gate impedance) ishigh. G_(m)*Z_(g) is proportional to F_(t), or the frequency for unitycurrent gain, of the transistor.

Because the input impedance of the amplifier 16 is high, the inductanceof the probe element 50 does not degrade significantly the input signalapplied to the probe element. Nevertheless, in order to minimizereception of stray signals by virtue of the probe element 50 acting asan antenna, the length of the probe element should be kept to a minimum.It is therefore desirable that the probe element is relatively short.Consequently, the inductance and the capacitance of the probe element issmall and does not contribute to signal degradation.

Because the amplifier 16 has a high input impedance, the conductor thatconnects the circuit under test to ground can have quite a highimpedance and therefore can be quite long. This makes it possible forthe ground connection to the circuit under test to be made by way of aseparate probe, rather than by way of a second probe element carried bythe substrate 10.

Referring to FIG. 7, another probe structure is illustrated. The probingelement of FIG. 4 is supported by the active circuit. The active circuitis interconnected to the substrate, which typically has a dielectricconstant of about 10, by the flexible interconnection. The activecircuit is preferably fabricated in a silicon or gallium arsenidematerial. The material preferably has a tapered edge under theconnection with the probing element. In this manner the tapered edgesreduces the capacitance by further limiting the amount of material underthe probing element. The probing element may be secured by epoxy, whichtypically has a dielectric constant between 4 and 5.

It will be appreciated that the present invention is not restricted tothe particular probe head that has been described and illustrated, andthat variations may be made therein. For example, instead of microstriptransmission lines, with the signal and ground conductors on oppositesides of the substrate 10, coplanar transmission lines may be used.Alternatively, a microstrip transmission line may be used for connectingthe output terminal of the amplifier to the measurement instrument. Inthis case, the amplifier 16 would be mounted near the end of themicrostrip transmission line and wires would be used to connect theamplifier to the bias supply 26. The by-pass capacitors 30 would bemounted near the amplifier. It is not essential to the invention that amonolithic integrated circuit be used for the amplifier 16, since ahybrid circuit may be used instead. For example, a split band amplifiermay be used. Also, the active circuit may be interconnected to aco-axial cable to which the probing element is supported.

The probe disclosed above has sufficient vertical compliance whenprobing a pad. In many cases the probe is placed in pressing contactwith the edge of the device under test, and vibration of the deviceunder test and/or the probing element results in significant horizontalmotion. The flexible interconnection having a rectangular shape tends toresult in limited horizontal compliance. In addition, when attempting tomake sufficient pressing contact with the edge of the device under test,especially with vibrational movement, the force imposed on the probingelement is significant. In order to increase the lateral compliance anddecrease the pressure exerted on the probing element when coming intopressing contact with the edge of a device under test, the flexiblematerial includes a bend therein, as illustrated in FIG. 8. Otherconfigurations and structures of the flexible material may be used toprovide an increased (or 1.5× or more, 2× or more, 4× or more, 6× ormore, 8× or more, or 10× or more) lateral compliance and/or decrease inpressure exerted than would have occurred if the material was simplyflat rectangular.

Another configuration that may be implemented is replacing the activecircuit with a primarily resistive element fabricated on thesemiconductor material (e.g., gallium arsenide, silicon). The resistivematerial has a resistance significantly greater than a traditional 50ohm resistive probing element, such as for example, 500 ohms, 1,000ohms, 2,500 ohms, and 5,000 ohms. The significant resistance lowers thecurrent drawn from the device under test. The resistive material alsopresents a low capacitance to the device under test, such as forexample, less than 25 fF, less than 15 fF, les than 10 fF, and less than5 fF. The relatively low capacitance reduces the loading on the deviceunder test. In some implementations, the resistive element may besupported by a substrate and be relatively small in value, such as forexample, less than 10,000 ohms, less than 5,000 ohms, less than 2,500ohms, and less than 1,000 ohms, while preferably being greater than 100ohms, 250 ohms, and 500 ohms. As it may be observed, using a resistiveelement has many advantages, such as one or more of the following,passes high frequencies, has limited loading on the device under test,does not need a bias circuit, has no voltage offsets, and is limited bythe power carrying capacity of the resistive element.

It is also noted that using a passive element, such as a resistor, alsotends to reduce issues surrounding electrostatic discharge, linearity ofthe response, increases usable bandwidth, increases the useful voltagerange, and is more readily fabricated.

Referring to FIG. 9, the performance characteristics of the active based(and resistive based) probing element has a capacitance that ispreferably less than 20 fF, more preferably less than 15 fF, morepreferably less than 10 fF between 5 GHz and 20 GHz, and more preferablybetween 1 GHz and 40 GHZ, and more preferably between 0 Hertz and 40GHz.

It has been observed that at relatively high frequencies, such as 40 GHzor above, that the loading of a 20:1 probe (950 ohm tip resistor) tendsto be dominated by the capacitance of the tip structure, which may befor example 10 fF (½ PI/10 fF/40 GHz=400 ohms). This impedance tends tohave a somewhat predictable effect on the edge rise times. However, thedirect current loading of an internal node of a device under test tendsto offset the bias point, and in some circuits with a high internaldirect current source impedance may corrupt the circuit behavior despitethe ability of the local devices to drive the load with transientvoltages.

Referring to FIG. 10, to mitigate this loading effect, or otherwisesubstantially eliminate this loading effect, a direct current “block”may be introduced, such as on the probe chip (support) or as an elementof the coaxial component. However, the ability to measure the directcurrent levels present in the device under test will be impaired. Theability to measure direct current levels may be maintained by tappinginto the signal at the tip with a sense resistor of relatively highresistance, such as for example, 0.05 M ohm to 10 M ohm or more,interconnected by a separate path to a high impedance (e.g., large senseresistor) voltage sensing device. The voltage sensed normally would readthe average voltage, which may then be calibrated to the scope'sapparent zero voltage level.

In some cases it has been determined that under some probing conditions,such as for probing printed circuit boards, it is desirable to include aprobing element that has definable geometry other than a “wire”, such asthe probing elements described herein. The probing element is typicallysupported by a supporting structure, such as a coupon, which is in turninterconnected to a transmission structure, such as a coaxial cable. Aflexible structure may be included between the coupon and thetransmission structure, if included.

In some cases, the user of the probe may exert excessive pressure on thedevice under test which likewise typically results in excessive bendingof the probe. While excessive pressure may damage the device under test,it is also likely to damage the probe itself thereby rending itinoperative. Referring to FIG. 11, the probe may include a structuralelement, such as a rigid tube, that acts to inhibit further bending ofthe probe upon testing a device under test. In this manner, the probemay bend a through a limited range of motion, without the potential ofexcessive bending. For example, the probe may be permitted to bendthrough a range of 10%, 20%, 30%, 45% or less with respect to the end ofthe probe and the length of the transmission structure, such as thecoaxial cable. Normally, the reach of the probe tip is less than thestructural element so that upon maximum bending the probe tip isprotected against being drug sideways and crushed by the structuralelement.

Referring to FIG. 12, in some cases the structural element will resultin decreased visibility of the probe tip and the device under test,normally being viewed using a microscope. A modified structure mayinclude a structural element that includes a material, such as siliconeor fabric cone, which folds inward with lateral displacement whichpermits a pointier probe.

In some embodiments it is desirable to be able to sense the movements ofa portion of the flexing of the tip portion or otherwise the flexing ofa portion of the probe, as a result of the probe tip coming into contactwith the device under test. Referring to FIG. 13, the flexibleinterconnection may include a strain gage 300 supported thereon. Thestrain gage 300 provides an indication to the system through a wire 310of the deflection of the flexible material. Referring to FIG. 14, theflexible interconnection may include a vibration sensor 340 (frequencyand/or amplitude) and/or the active circuit includes a vibration sensor342 (frequency and/or amplitude). The vibration sensors 340 and 342provide an indication to the system through a wire 344 of the contact ofthe probe with the device under test. For example, the vibration sensormay include a 30 kHz piezoelectric oscillator. Referring to FIG. 15, theactive circuit or flexible interconnection may include reflectivematerial 350 and 352, respectively. Light 360, such as laser light, maybe reflected off the reflective material 350 and/or 352. A sensor 362senses the light reflected from the reflective material 350 and/or 352.Based upon the location that the light is reflected, which relates tothe angle of deflection, the system may infer some information regardingthe probe contacting the device under test and the strain imposed on theprobe and/or device under test.

In this manner, some indication is available of when the probe makescontact with the device under test. In addition, some indication isavailable of the pressure exerted by the probe with the device undertest. In some cases, the operator may exert excessive force by the probeon the device under test, thereby causing damage to the probe or thedevice under test. In order to alleviate this concern, an indication maybe provided to the operator of the device pressure level so thatexcessive pressure is not exerted by the probe. Further, the system mayinclude automatic controls to inhibit the ability of the probe to exceedsome threshold, and thus reduce the likelihood of damage to the probe orthe device under test.

Referring to FIG. 16, it is desirable in some embodiments to permitdifferential probing of multiple devices under test (or a single devicewith two channels, if desired) by using a plurality of probing elements.For example, the active circuit 400 may include a pair of activeelements (or resistive elements) thereon. Each of the elongate probingelements 402, 404 may be interconnected to respective active elementswhich are interconnected to a respective set of signal paths 406. Theactive elements are interconnected to the substrate 408 by a flexibleinterconnection 409. Each signal path may be a single line, or morepreferably a ground-signal-ground path which provides improved signalintegrity.

Referring to FIG. 17, it is desirable in some embodiments fordifferential probing to include a plurality of active circuits (orresistive elements) 410 and 412 each of which is supported by asubstrate. An elongate probing element 414 and 416, respectively, isinterconnected to the respective active circuit 410 and 412. The activecircuits 410 and 412 are interconnected to the substrate 430 by arespective pair of flexible interconnects 432 and 434. The activecircuits 410 and 412 are interconnected to a respective set of signalpaths 420 and 422. The substrates for the two active circuits may beinterconnected by a member 440, which is preferably not rigid (albeit itcould be) to provide some increased rigidity to the probe and assist inmaintaining a suitable alignment of the probe contacts.

The terms and expressions which have been employed in the foregoingspecification are used therein as terms of description and not oflimitation, and there is no intention, in the use of such terms andexpressions, of excluding equivalents of the features shown anddescribed or portions thereof, it being recognized that the scope of theinvention is defined and limited only by the claims which follow.

1. A probe for testing a device under test comprising: (a) an elongateprobing element; (b) an active circuit having an input with a firstimpedance, of more than 1,000 ohms and less than 1,000 fF, electricallyinterconnected to said probing element and a second input; (c) aflexible structure interconnecting said active element and a supportingstructure such that when said probing element comes into contact withsaid device under test said flexible structure flexes; (d) atransmission structure electrically interconnected to said second input.2. The probe of claim 1 wherein said first impedance has a resistancegreater than 500 K Ohms.
 3. The probe of claim 1 wherein said firstimpedance has a resistance greater than 1,000 K Ohms.
 4. The probe ofclaim 1 wherein said first impedance has a capacitance less than 25 fF.5. The probe of claim 1 wherein said supporting structure includes atransmission structure and said flexible structure includes the sameclass of transmission structure.
 6. A probe for testing a device undertest comprising: (a) an elongate probing element; (b) an active circuithaving an input with a first impedance, of more than 1,000 ohms and lessthan 1,000 fF, electrically interconnected to said probing element and asecond input; (c) a transmission structure electrically interconnectedto said second input; (d) wherein said elongate probing element is lessthan 200 microns in length.
 7. The probe of claim 6 wherein said probingelement is less than 150 microns in length.
 8. The probe of claim 6wherein said probing element is less than 100 microns in length.
 9. Theprobe of claim 6 wherein said probing element is less than 75 microns inlength.
 10. The probe of claim 6 wherein said probing element is lessthan 40 microns in length.
 11. A probe for testing a device under testcomprising: (a) an elongate non-substantially cylindrical probingelement; (b) an active circuit having an input with a first impedance,of more than 1,000 ohms and less than 1,000 fF, electricallyinterconnected to said probing element and a second input; and (c) atransmission structure electrically interconnected to said second input.12. The probe of claim 11 wherein said probing element is less than 100microns in length.
 13. The probe of claim 12 wherein said probingelement is less than 75 microns in length.
 14. The probe of claim 13wherein said probing element is less than 40 microns in length.
 15. Theprobe of claim 11 wherein said probing element has a tapering tipportion over at least 25% of the length of said probing element.
 16. Theprobe of claim 11 wherein said probing element has a tapering tipportion over at least 35% of the length of said probing element.
 17. Theprobe of claim 11 wherein said probing element has a tapering tipportion over at least 50% of the length of said probing element.
 18. Theprobe of claim 11 wherein said probing element has a tapering tipportion over at least 75% of the length of said probing element.
 19. Theprobe of claim 15 wherein said tapering portion continually decreases incross sectional area along a majority of said tapered portion.
 20. Theprobe of claim 16 wherein said tapering portion continually decreases incross sectional area along a majority of said tapered portion.
 21. Theprobe of claim 17 wherein said tapering portion continually decreases incross sectional area along a majority of said tapered portion.
 22. Theprobe of claim 18 wherein said tapering portion continually decreases incross sectional area along a majority of said tapered portion.
 23. Aprobe for testing a device under test comprising: (a) an elongateprobing element; (b) an active circuit having an input with a firstimpedance, of more than 1,000 ohms and less than 1,000 fF, electricallyinterconnected to said probing element and a second input; (c) atransmission structure electrically interconnected to said second input;(d) wherein said probe imposes a capacitance of less than 20 fF on saiddevice under test.
 24. The probe of claim 23 wherein said probe imposesa capacitance of less than 18 fF on said device under test.
 25. Theprobe of claim 23 wherein said probe imposes a capacitance of less than18 fF on said device under test.
 26. The probe of claim 23 wherein saidprobe imposes a capacitance of less than 16 fF on said device undertest.
 27. The probe of claim 23 wherein said probe imposes a capacitanceof less than 14 fF on said device under test.
 28. The probe of claim 23wherein said probe imposes a capacitance of less than 12 fF on saiddevice under test.
 29. The probe of claim 23 wherein said probe imposesa capacitance of less than 10 fF on said device under test.
 30. A probefor testing a device under test comprising: (a) an elongate probingelement; (b) an active circuit having an input with a first impedance,of more than 1,000 ohms and less than 1,000 fF, electricallyinterconnected to said probing element and a second input; (c) atransmission structure electrically interconnected to said second input;(d) wherein said elongate probing element imposes a capacitance of lessthan 10 fF on said device under test.
 31. The probe of claim 29 whereinsaid probe imposes a capacitance of less than 8 fF on said device undertest.
 32. The probe of claim 29 wherein said probe imposes a capacitanceof less than 6 fF on said device under test.
 33. The probe of claim 29wherein said probe imposes a capacitance of less than 4 fF on saiddevice under test.
 34. The probe of claim 29 wherein said probe imposesa capacitance of less than 2 fF on said device under test.
 35. A probefor testing a device under test comprising: (a) an elongate probingelement; (b) an active circuit having an input with a first impedance,of more than 1,000 ohms and less than 1,000 fF, electricallyinterconnected o said probing element and a second input; (c) atransmission structure electrically interconnected to said second input;(d) wherein the portion of said probe from said first input to saiddevice under test imposes a capacitance of less than 10 fF on saiddevice under test.
 36. The probe of claim 34 wherein said probe imposesa capacitance of less than 8 fF on said device under test.
 37. The probeof claim 34 wherein said probe imposes a capacitance of less than 6 fFon said device under test.
 38. The probe of claim 34 wherein said probeimposes a capacitance of less than 4 fF on said device under test. 39.The probe of claim 34 wherein said probe imposes a capacitance of lessthan 2 fF on said device under test.
 40. A probe for testing a deviceunder test comprising: (a) an elongate probing element; (b) an activecircuit having an input with a first impedance, of more than 1,000 ohmsand less than 1,000 fF, electrically interconnected to said probingelement and a second input; (c) a transmission structure electricallyinterconnected to said second input; (d) wherein said elongate probingelement is free from being an elongate substantially cylindrical shape.41. The probe of claim 39 wherein said probe has a triangular crosssection.
 42. The probe of claim 40 wherein said probe has a taperingportion over at least 25% of the length of said probing element.
 43. Aprobe for testing a device under test comprising: (a) an elongateprobing element; (b) an active circuit having an input with a firstimpedance, of more than 1,000 ohms and less than 1,000 fF, electricallyinterconnected to said probing element and a second input; (c) atransmission structure electrically interconnected to said second input;(d) wherein said elongate probing element has a generally tapering tipportion over at least 25 percent of the length of said elongate probingelement.
 44. The probe of claim 42 wherein said probing element has atapering tip portion over at least 35% of the length of said probingelement.
 45. The probe of claim 42 wherein said probing element has atapering tip portion over at least 50% of the length of said probingelement.
 46. The probe of claim 42 wherein said probing element has atapering tip portion over at least 75% of the length of said probingelement.
 47. The probe of claim 42 wherein said tapering portioncontinually decreases in cross sectional area along a majority of saidtapered portion.
 48. The probe of claim 43 wherein said tapering portioncontinually decreases in cross sectional area along a majority of saidtapered portion.
 49. The probe of claim 44 wherein said tapering portioncontinually decreases in cross sectional area along a majority of saidtapered portion.
 50. The probe of claim 45 wherein said tapering portioncontinually decreases in cross sectional area along a majority of saidtapered portion.
 51. A probe for testing a device under test comprising:(a) an elongate probing element; (b) an active circuit having an inputwith a first impedance, of more than 1,000 ohms and less than 1,000 fF,electrically interconnected to said probing element and a second input;(c) a transmission structure electrically interconnected to said secondinput; (d) wherein said elongate probing element is supported by asubstrate where the impedance change between the region of said elongateprobing element not in contact with said substrate and the region ofsaid elongate probing element in contact with said substrate isnon-abrupt.
 52. A probe for testing a device under test comprising: (a)an elongate probing element; (b) an active circuit having an input witha first impedance, of more than 1,000 ohms and less than 1,000 fF,electrically interconnected to said probing element and a second input;(c) a transmission structure electrically interconnected to said secondinput; (d) wherein said elongate probing element is formed within asacrificial substrate.
 53. The probe of claim 51 wherein a depression isformed in said sacrificial substrate.
 54. The probe of claim 52 whereinconductive material located within said depression forms said elongateprobing element.
 55. A probe for testing a device under test comprising:(a) an elongate probing element; (b) an active circuit having an inputwith a first impedance, of more than 1,000 ohms and less than 1,000 fF,electrically interconnected to said probing element and a second input;(c) a transmission structure electrically interconnected to said secondinput; (d) wherein said elongate probing element fractures afterrepeated use thereby resulting in a shorter elongate probing element.56. A probe for testing a device under test comprising: (a) an elongateprobing element; (b) an active circuit having an input with a firstimpedance, of more than 1,000 ohms and less than 1,000 fF, electricallyinterconnected to said probing element and a second input; (c) atransmission structure electrically interconnected to said second input;(d) wherein said elongate probing element includes rhodium in contactwith said device under test during probing.
 57. A probe for testing adevice under test comprising: (a) an elongate probing element; (b) anactive circuit supported by a substrate having an input with a firstimpedance, of more than 1,000 ohms and less than 1,000 fF, electricallyinterconnected to said probing element and a second input, wherein saidsubstrate has a thickness; (c) a transmission structure electricallyinterconnected to said second input; (d) wherein a portion of saidsubstrate supporting said elongate probing element have a variablethickness.
 58. The probe of claim 56 wherein said variable thickness ishas an acute angular surface with respect to the top surface of saidsubstrate.
 59. The probe of claim 57 wherein a portion of the angularsurface has adhesive adhered thereto.
 60. The probe of claim 58 whereinthe dielectric constant of said substrate is greater than the dielectricconstant of said adhesive.
 61. A probe for testing a device under testcomprising: (a) an elongate probing element; (b) an active circuithaving an input with a first impedance, of more than 1,000 ohms and lessthan 1,000 fF, electrically interconnected to said probing element and asecond input; (c) a transmission structure electrically interconnectedto said second input; (d) wherein said elongate probing element is freefrom substantial flexing when engaged with said device under test whichprobing.
 62. The probe of claim 60 further comprising a flexiblestructure interconnecting said active element and a supporting structuresuch that when said probing element comes into contact with said deviceunder test said flexible structure flexes substantially more than saidprobing element.
 63. A probe for testing a device under test comprising:(a) an elongate probing element; (b) a resistive element supported by asubstrate wherein said resistive element is less than 10,000 ohms andgreater than 100 ohms, wherein the input capacitance of the probe isless than 1,000 fF; (c) a flexible structure interconnecting saidresistive element and a supporting structure such that when said probingelement comes into contact with said device under test said flexiblestructure flexes; (d) a transmission structure electricallyinterconnected to said resistive element.
 64. The probe of claim 63wherein said resistive element is less than 2,500 ohms.
 65. The probe ofclaim 63 wherein said resistive element is less than 1,000 ohms.
 66. Theprobe of claim 63 wherein said input capacitance is less than 100 fF.67. The probe of claim 63 wherein said input capacitance is less than 25fF.
 68. The probe of claim 1 wherein the capacitance of said resistivematerial is less than 10 fF.
 69. A probe for testing a device under testcomprising: (a) an elongate probing element; (b) said probing elementfree from incurring substantial flexing under a probing condition ofless than 10 grams of pressure while establishing effective probing of adevice under test; (c) a flexible structure interconnecting said probingelement and a supporting structure such that when said probing elementcomes into contact with said device under test said flexible structureflexes; (d) a transmission structure electrically interconnected to saidprobing element.